The influence of temperature in semiconductor processing is very huge. When the temperature is very low, the intrinsic excitation is ignored, and the carriers are mainly provided by impurity ionization, which increases with increasing temperature; scattering is mainly determined by ionized impurities, and the mobility increases with increasing temperature, so the resistivity decreases.
The temperature continues to rise, all impurities are ionized, and the carrier is basically unchanged when the intrinsic excitation is not significant. The lattice vibration is the main influencing factor. The mobility decreases with increasing temperature, so the resistivity increases with increasing temperature.
The silicone flexible heating pad provides the temperature for the semiconductor processing equipment. The heating effects can be customized on the demand with different sizes, voltage, wattage. And the temperature control is very important, so normally it is equipped with a temperature control system to adjust the temperature.
General factors of the silicone flexible heating pad
Other usages in the equipment
Customized shapes for your reference of the heating pad
Qualified certificate of the flexible silicone heating pad